Alle Publikationen

Treffer: 1

2016
. IEEE Conference on Computer Vision and Pattern Recognition; Institute of Electrical and Electronics Engineers; Cvpr (2016): 29th IEEE Conference on Computer Vision and Pattern Recognition. CVPR 2016 : proceedings : 26 June-1 July 2016, Las Vegas, Nevada. Unter Mitarbeit von Růžena Bajcsy, Fei-Fei Li und Tinne Tuytelaars. Piscataway, NJ: IEEE

Keywords: Maschinelles Sehen, Mustererkennung

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